Online Monitoring for ppt-level Metals, Nanoparticles and Organic Contaminants
Real-time monitoring of semiconductor process chemicals and ultrapure water at fab-wide scale
Most Automated Vapor Phase Decomposition System
- Radian 3 VPD-ICPMS – Compact high productivity with all-in-one process module
- Radian 7 VPD-ICPMS – Highest productivity with dual all-in-one process modules
- Innovative radial fast-scanning nozzle – scans wafer surface in 60 seconds or less
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Online Nanoparticle & Total Metals Monitoring
- Multi-element determination of nanoparticle size and quantity
- Multi-element determination of total metals
- Autocalibration of nanoparticle and total metals
- Analyzes all semiconductor grade chemicals
- Up to 40 sampling points
- Up to 300 m in any direction
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Real-time Ultra-trace Metal Monitoring
- Immediate detection and notification of metal contamination
- Improved product yield
- Reduced human contact with hazardous chemical samples, improving safety and reducing manual handling errors
- Customizable software to enable flexible, user-defined parameters for contamination control at every sampling station
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Monitoring of Organic Contaminants
- Up to 40 scoutCARBON Sample Points
- Rapidly transfers discrete samples up to 300 m to a scoutCARBON Central Unit
- Detects organic contaminations/impurities in facility chemicals, environmental effluents, chemical baths and other liquid samples
- Simultaneously monitors the full range of semiconductor chemicals
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Fully Automated Metals Analysis Lab
- Laboratory based online system for 24/7 metal monitoring
- Direct connection of chemical supply to the scoutLAB
- High capacity system for up to 20 direct chemical samplers
- Onboard autosampler option for laboratory analysis
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Total Organic Carbon Online Monitoring
- Quantitative analysis of total organic carbon in UPW and waste water
- TOC range <0.2 to 1000 ppm C
- A single central analyzer monitors:
- Up to 40 sampling points
- Up to 300 m in any direction
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Monitoring of Silicon Nitride Etching
- Fully automated unattended measurement of ppm level free silicon and simultaneous monitoring of bound silicon
- Capable of monitoring free and bound silicon in hot phosphoric baths
- Autocalibration and verification to ensure accurate and precise monitoring of silicon in hot phosphoric baths
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