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Elemental Scientific - Innovative Leaders in Semiconductor Online Monitoring, Laboratory Automation, Laser Ablation, Glassware & Nebulization

Scout Semiconductor Online Monitoring Systems

Online Monitoring for ppt-level Metals, Nanoparticles and Organic Contaminants

Real-time monitoring of semiconductor process chemicals and ultrapure water at fab-wide scale

Most Automated Vapor Phase Decomposition System

  • Radian 3 VPD-ICPMS – Compact high productivity with all-in-one process module
  • Radian 7 VPD-ICPMS – Highest productivity with dual all-in-one process modules
  • Innovative radial fast-scanning nozzle – scans wafer surface in 60 seconds or less

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Online Nanoparticle & Total Metals Monitoring

  • Multi-element determination of nanoparticle size and quantity
  • Multi-element determination of total metals
  • Autocalibration of nanoparticle and total metals
  • Analyzes all semiconductor grade chemicals
    • Up to 40 sampling points
    • Up to 300 m in any direction

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Real-time Ultra-trace Metal Monitoring

  • Immediate detection and notification of metal contamination
  • Improved product yield
  • Reduced human contact with hazardous chemical samples, improving safety and reducing manual handling errors
  • Customizable software to enable flexible, user-defined parameters for contamination control at every sampling station

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Monitoring of Organic Contaminants

  • Up to 40 scoutCARBON Sample Points
  • Rapidly transfers discrete samples up to 300 m to a scoutCARBON Central Unit
  • Detects organic contaminations/impurities in facility chemicals, environmental effluents, chemical baths and other liquid samples
  • Simultaneously monitors the full range of semiconductor chemicals

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Fully Automated Metals Analysis Lab

  • Laboratory based online system for 24/7 metal monitoring
  • Direct connection of chemical supply to the scoutLAB
  • High capacity system for up to 20 direct chemical samplers
  • Onboard autosampler option for laboratory analysis

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Total Organic Carbon Online Monitoring

  • Quantitative analysis of total organic carbon in UPW and waste water
  • TOC range <0.2 to 1000 ppm C
  • A single central analyzer monitors:
    • Up to 40 sampling points
    • Up to 300 m in any direction

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Monitoring of Silicon Nitride Etching

  • Fully automated unattended measurement of ppm level free silicon and simultaneous monitoring of bound silicon
  • Capable of monitoring free and bound silicon in hot phosphoric baths
  • Autocalibration and verification to ensure accurate and precise monitoring of silicon in hot phosphoric baths

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Contact us for information on our Online Monitoring Systems!

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