Real-time monitoring of semiconductor process chemicals and ultrapure water (UPW) is vital to provide the information needed to improve manufacturing processes and maximize product yield. Metal impurities are monitored in process chemicals at delivery (by tanker or drums), at the central chemical supply, at distribution points, and at the point of use. Chemical monitoring is required 24/7 to verify low or even sub-ppt levels of metal contamination.
Each scoutDX remote module collects and transfers a sample (TX model) or collects, dilutes, and transfers a viscous sample (DTX model) providing:
The scoutDX controls up to 20 remote sampling modules. Each module collects a small amount of a chemical or stream and transfers it to the central scoutDX system for ICP-MS analysis. Rapid transfer rates allow the system to provide real-time ICP-MS detection of ultratrace metal impurities in each chemical. This capability allows monitoring at many locations throughout the semiconductor fabrication plant without compromising detection limits.
The fully automated scoutDX central module is capable of:
Intuitive software controls the scoutDX central module and ICP-MS, as well as all remote modules. Communication of data and tool status uses industry standard machine control and communication protocols. Element-specific limits for contaminants can be user-defined for each sampling point. Any values that exceed the user-defined limits trigger an alarm. An alert is also sent to the central system.
As organizations look to improve productivity and use real-time data to better understand and improve processes, the scoutDX/ICP-MS system offers several benefits:
scoutDX Central System